The European Physical Journal D / Atomic, Molecular, Optical and Plasma Physics
2011 / 10 Vol. 64; Iss. 2-3
Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges
V. Stranak, H. Wulff, R. Bogdanowicz, S. Drache, Z. Hubicka, M. Cada, M. Tichy, R. HipplerVolume:
64
Language:
english
Pages:
9
DOI:
10.1140/epjd/e2011-20393-7
Date:
October, 2011
File:
PDF, 1.59 MB
english, 2011