Dry etching of germanium using inductively coupled...

Electronic Materials Letters 2010 / 03 Vol. 6; Iss. 1

Dry etching of germanium using inductively coupled Ar/CCl2F2/Cl2plasma

Taek Sung Kim, Sang-Sik Choi, Mi Im Shin, Tae Soo Jeong, Sukil Kang, Chel-Jong Choi, Kyu-Hwan Shim
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Volume:
6
Language:
english
Pages:
5
DOI:
10.3365/eml.2010.03.035
Date:
March, 2010
File:
PDF, 611 KB
english, 2010
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