Effects of defects generated in ALD TiO2films on electrical...

Metals and Materials International 2008 / 12 Vol. 14; Iss. 6

Effects of defects generated in ALD TiO2films on electrical properties and interfacial reaction in TiO2/SiO2/Si system upon annealing in vacuum

Sanghee Won, Seunghee Go, Wonhee Lee, Kyunghoon Jeong, Hyunsuk Jung, Chongmu Lee, Eungu Lee, Jaegab Lee
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Volume:
14
Language:
english
Pages:
7
DOI:
10.3365/met.mat.2008.12.759
Date:
December, 2008
File:
PDF, 445 KB
english, 2008
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