Intrinsic stress in ZrN thin films: Evaluation of grain boundary contribution from in situ wafer curvature and ex situ x-ray diffraction techniques
Koutsokeras, L. E., Abadias, G.Volume:
111
Year:
2012
Language:
english
DOI:
10.1063/1.4710530
File:
PDF, 1.43 MB
english, 2012