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A spin-on photosensitive polymeric etch protection mask for anisotropic wet etching of silicon
Dalvi-Malhotra, J, Zhong, X F, Planje, C, Brand, G, Yess, KVolume:
18
Year:
2008
Language:
english
DOI:
10.1088/0960-1317/18/2/025029
File:
PDF, 597 KB
english, 2008