Detailed arsenic concentration profiles at Si/SiO2...

Journal of Applied Physics 2008 Vol. 104; Iss. 4

Detailed arsenic concentration profiles at Si/SiO2 interfaces

Pei, Lirong, Duscher, Gerd, Steen, Christian, Pichler, Peter, Ryssel, Heiner, Napolitani, Enrico, De Salvador, Davide, Piro, Alberto Maria, Terrasi, Antonio, Severac, Fabrice, Cristiano, Filadelfo, Ra
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Volume:
104
Year:
2008
Language:
english
DOI:
10.1063/1.2967713
File:
PDF, 1.06 MB
english, 2008
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