Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications
Cushen, Julia D., Otsuka, Issei, Bates, Christopher M., Halila, Sami, Fort, Sébastien, Rochas, Cyrille, Easley, Jeffrey A., Rausch, Erica L., Thio, Anthony, Borsali, RedouaneVolume:
6
Year:
2012
Language:
english
Pages:
10
DOI:
10.1021/nn300459r
File:
PDF, 815 KB
english, 2012