Oligosaccharide/Silicon-Containing Block Copolymers with 5...

Oligosaccharide/Silicon-Containing Block Copolymers with 5 nm Features for Lithographic Applications

Cushen, Julia D., Otsuka, Issei, Bates, Christopher M., Halila, Sami, Fort, Sébastien, Rochas, Cyrille, Easley, Jeffrey A., Rausch, Erica L., Thio, Anthony, Borsali, Redouane
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Volume:
6
Year:
2012
Language:
english
Pages:
10
DOI:
10.1021/nn300459r
File:
PDF, 815 KB
english, 2012
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