Stress hysteresis and mechanical properties of...

Journal of Applied Physics 2004 Vol. 95; Iss. 3

Stress hysteresis and mechanical properties of plasma-enhanced chemical vapor deposited dielectric films

Thurn, Jeremy, Cook, Robert F., Kamarajugadda, Mallika, Bozeman, Steven P., Stearns, Laura C.
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Volume:
95
Year:
2004
Language:
english
DOI:
10.1063/1.1635647
File:
PDF, 366 KB
english, 2004
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