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Structural analysis, elemental profiling, and electrical characterization of HfO2 thin films deposited on In0.53Ga0.47As surfaces by atomic layer deposition
Long, R. D., OConnor, E., Newcomb, S. B., Monaghan, S., Cherkaoui, K., Casey, P., Hughes, G., Thomas, K. K., Chalvet, F., Povey, I. M., Pemble, M. E., Hurley, P. K.Volume:
106
Year:
2009
Language:
english
DOI:
10.1063/1.3243234
File:
PDF, 826 KB
english, 2009