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Low-Hydrogen-Content Silicon Nitride Deposited at Room Temperature by Inductively Coupled Plasma Deposition
Zhou, Haiping, Elgaid, Khaled, Wilkinson, Chris, Thayne, IainVolume:
45
Year:
2006
Language:
english
Pages:
5
DOI:
10.1143/jjap.45.8388
File:
PDF, 204 KB
english, 2006