Bonding and XPS chemical shifts in ZrSiO4 versus SiO2 and...

Physical Review B 2001 Vol. 63; Iss. 12

Bonding and XPS chemical shifts in ZrSiO4 versus SiO2 and ZrO2: Charge transfer and electrostatic effects

Guittet, M., Crocombette, J., Gautier-Soyer, M.
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Volume:
63
Year:
2001
Language:
english
DOI:
10.1103/physrevb.63.125117
File:
PDF, 247 KB
english, 2001
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