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Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films
Ehiasarian, A. P., Vetushka, A., Gonzalvo, Y. Aranda, Safran, G., Szekely, L., Barna, P. B.Volume:
109
Year:
2011
Language:
english
DOI:
10.1063/1.3579443
File:
PDF, 5.24 MB
english, 2011