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[ SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] - Combined dose and geometry correction (DMG) for low energy multi electron beam lithography (5kV): application to the 16nm node
Martin, Luc, Manakli, Serdar, Bayle, Sebastien, Belledent, Jérôme, Soulan, Sebastien, Wiedemann, Pablo, Farah, Abdi, Schiavone, Patrick, Tong, William M.Language:
english
Pages:
1
DOI:
10.1117/12.916064
File:
PDF, 739 KB
english