[ SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] - Combined dose and geometry correction (DMG) for low energy multi electron beam lithography (5kV): application to the 16nm node

The file will be sent to your email address. It may take up to 1-5 minutes before you receive it.

The file will be sent to you via the Telegram messenger. It may take up to 1-5 minutes before you receive it.

Note: Make sure you have linked your account to Z-Library Telegram bot.

The file will be sent to your Kindle account. It may take up to 1–5 minutes before you receive it.

Please note: you need to verify every book you want to send to your Kindle. Check your mailbox for the verification email from Amazon Kindle.