![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Photoresist outgassing: a potential Achilles heel for short-wavelength optical lithography?
Kunz, Roderick R., Sturtevant, John L.Volume:
5376
Year:
2004
Language:
english
Pages:
15
DOI:
10.1117/12.533535
File:
PDF, 328 KB
english, 2004