Transient enhanced diffusion and defect microstructure in high dose, low energy As+ implanted Si
Krishnamoorthy, V., Moller, K., Jones, K. S., Venables, D., Jackson, J., Rubin, L.Volume:
84
Year:
1998
Language:
english
DOI:
10.1063/1.368896
File:
PDF, 565 KB
english, 1998