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[IEEE 2012 23rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY (2012.05.15-2012.05.17)] 2012 SEMI Advanced Semiconductor Manufacturing Conference - In-line metrology capability for epitaxial multi-stack SiGe layers
Le Cunff, D., Couvrat, S., Abbate, F.Year:
2012
Language:
english
Pages:
7
DOI:
10.1109/asmc.2012.6212880
File:
PDF, 474 KB
english, 2012