[IEEE 2012 23rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY (2012.05.15-2012.05.17)] 2012 SEMI Advanced Semiconductor Manufacturing Conference - Use of 22 nm Litho SEM non-visual defect data as a process quality indicator
Boye, C. A., Penny, C. J., Connors, J., Boyles, D., Janicki, C., Ghaskadvi, R., Hahn, R.Year:
2012
Language:
english
Pages:
4
DOI:
10.1109/asmc.2012.6212931
File:
PDF, 1.31 MB
english, 2012