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N and Ar ion‐implantation effects in SiO2 films on Si single‐crystal substrates
Mazzoldi, P., Carnera, A., Caccavale, F., Favaro, M. L., Boscolo‐Boscoletto, A., Granozzi, G., Bertoncello, R., Battaglin, G.Volume:
70
Year:
1991
Language:
english
DOI:
10.1063/1.349248
File:
PDF, 1.41 MB
english, 1991