N and Ar ion‐implantation effects in SiO2 films on Si...

N and Ar ion‐implantation effects in SiO2 films on Si single‐crystal substrates

Mazzoldi, P., Carnera, A., Caccavale, F., Favaro, M. L., Boscolo‐Boscoletto, A., Granozzi, G., Bertoncello, R., Battaglin, G.

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Volume:

Year:

1991

Language:

english

DOI:

10.1063/1.349248

File:

PDF, 1.41 MB

english, 1991

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