Removal of nanoparticles on silicon wafer using a self-channeled plasma filament
Park, Jung-Kyu, Yoon, Ji-Wook, Whang, Kyung-Hyun, Cho, Sung-HakVolume:
108
Language:
english
Pages:
6
Journal:
Applied Physics A
DOI:
10.1007/s00339-012-7024-1
Date:
August, 2012
File:
PDF, 1022 KB
english, 2012