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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry
Burns, Sean D., Schmid, Gerard M., Trinque, Brian C., Willson, James, Wunderlich, Jennifer, Tsiartas, Pavlos C., Taylor, James C., Burns, Ryan L., Wilson, C. Grant, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
Pages:
13
DOI:
10.1117/12.485182
File:
PDF, 200 KB
english, 2003