Adsorption of Cationic Surfactants onto Photoresist Surfaces—A Way to Reduce Pattern Collapse in High Aspect Ratio Patterning
A. Drechsler, N. Petong, C. Bellmann, A. Synytska, P. Busch, M. Stamm, K. Grundke, O. WunnickeVolume:
84
Year:
2006
Language:
english
Pages:
7
DOI:
10.1002/cjce.5450840102
File:
PDF, 254 KB
english, 2006