Deposition, annealing and characterisation of high-dielectric-constant metal oxide films
H. Treichel, A. Mitwalsky, G. Tempel, G. Zorn, D. A. Bohling, K. R. Coyle, B. S. Felker, M. George, W. Kern, A. P. Lane, N. P. SandlerVolume:
5
Year:
1995
Language:
english
Pages:
13
DOI:
10.1002/amo.860050305
File:
PDF, 869 KB
english, 1995