Strongly Reduced Si Surface Recombination by Charge...

ChemPhysChem 2012 Vol. 13; Iss. 12

Strongly Reduced Si Surface Recombination by Charge Injection during Etching in Diluted HF/HNO3

Stefanie M. Greil, Dr. Andreas Schöpke, Dr. Jörg Rappich
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
13
Year:
2012
Language:
english
Pages:
1
DOI:
10.1002/cphc.201200269
File:
PDF, 1.16 MB
english, 2012
Conversion to is in progress
Conversion to is failed