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High-rate, low-temperature sputtering method of facing-targets type and its application for deposition of magnetic films
Youichi Hoshi, Masahiko Naoe, Shun'Ichi YamanakaVolume:
65
Year:
1982
Language:
english
Pages:
7
DOI:
10.1002/ecja.4410650614
File:
PDF, 566 KB
english, 1982