Influence of the Ta migration on dielectric properties of anodized Al-Ta(N)-Al trilayered oxide films
Tsuyoshi Dobashi, Toshiji Umezawa, Katsutaka Sasaki, Atsushi NoyaVolume:
72
Year:
1989
Language:
english
Pages:
8
DOI:
10.1002/ecjb.4420720903
File:
PDF, 561 KB
english, 1989