Development of single-layer positive resist process for...

Electronics and Communications in Japan (Part II: Electronics)) 1995 Vol. 78; Iss. 8

Development of single-layer positive resist process for electron beam direct writing technology

Hidenori Yamaguchi, Toshio Sakamizu, Fumio Murai, Hiroshi Shiraishi, Hajime Hayakawa, Keiko Hasegawa, Shinji Okazaki
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Volume:
78
Year:
1995
Language:
english
Pages:
11
DOI:
10.1002/ecjb.4420780809
File:
PDF, 1.43 MB
english, 1995
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