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An approach to realize deep submicron multilevel interconnection using low-resistance and low-ϵ materials
Yoshio Homma, Kikuo Kusukawa, Takeshi Furusawa, Hiroshi Miyazaki, Nobuyoshi KobayashiVolume:
78
Year:
1995
Language:
english
Pages:
13
DOI:
10.1002/ecjb.4420781007
File:
PDF, 1.81 MB
english, 1995