Modeling of electron beam scattering in high resolution...

Transactions on Emerging Telecommunications Technologies 1990 Vol. 1; Iss. 2

Modeling of electron beam scattering in high resolution lithography for the fabrication of X-Ray masks

M. Gentili, A. Lucchesini, L. Scopa, P. Lugli, A. Paoletti, G. Messina, S. Santangelo, A. Tucciarone
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Volume:
1
Year:
1990
Language:
english
Pages:
5
DOI:
10.1002/ett.4460010211
File:
PDF, 647 KB
english, 1990
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