Excellent Si surface passivation by low temperature SiO2 using an ultrathin Al2O3 capping film
G. Dingemans, M. C. M. van de Sanden, W. M. M. KesselsVolume:
5
Year:
2011
Language:
english
Pages:
3
DOI:
10.1002/pssr.201004378
File:
PDF, 219 KB
english, 2011