Excellent silicon surface passivation with 5 Å thin ALD Al2O3 layers: Influence of different thermal post-deposition treatments
Armin Richter, Jan Benick, Martin Hermle, Stefan W. GlunzVolume:
5
Year:
2011
Language:
english
Pages:
3
DOI:
10.1002/pssr.201105188
File:
PDF, 294 KB
english, 2011