Driving Force for Free-Carbon Incorporation in Chromium...

Chemical Vapor Deposition 1998 Vol. 4; Iss. 3

Driving Force for Free-Carbon Incorporation in Chromium Carbide Films Processed by MOCVD

Constantin Vahlas, Nong Moon Hwang, Latifa Gueroudji, Francis Maury
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Volume:
4
Year:
1998
Language:
english
Pages:
1
DOI:
10.1002/(sici)1521-3862(199805)04:033.0.co;2-p
File:
PDF, 213 KB
english, 1998
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