Low-Temperature Thermal CVD of Ti–Al Metal Films Using a Strong Reducing Agent
Audunn Ludviksson, Matthew Nooney, Robert Bruno, Alec Bailey, Toivo T. Kodas, Mark J. Hampden-SmithVolume:
4
Year:
1998
Language:
english
Pages:
1
DOI:
10.1002/(sici)1521-3862(199807)04:043.0.co;2-j
File:
PDF, 210 KB
english, 1998