Highly Volatile, Low Melting, Fluorine-Free Precursors for...

Highly Volatile, Low Melting, Fluorine-Free Precursors for Metal-Organic Chemical Vapor Deposition of Lanthanide Oxide-Containing Thin Films

John A. Belot, Anchuan Wang, Richard J. McNeely, Louise Liable-Sands, Arnold L. Rheingold, Tobin J. Marks
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Volume:
5
Year:
1999
Language:
english
Pages:
5
DOI:
10.1002/(sici)1521-3862(199903)5:23.0.co;2-b
File:
PDF, 369 KB
english, 1999
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