Thermodynamic Modeling of the Ti-Al-N System and...

Chemical Vapor Deposition 1999 Vol. 5; Iss. 3

Thermodynamic Modeling of the Ti-Al-N System and Application to the Simulation of CVD Processes of the (Ti,Al)N Metastable Phase

Stéphanie Anderbouhr, Sandra Gilles, Elisabeth Blanquet, Claude Bernard, Roland Madar
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Volume:
5
Year:
1999
Language:
english
Pages:
7
DOI:
10.1002/(sici)1521-3862(199906)5:33.0.co;2-0
File:
PDF, 528 KB
english, 1999
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