Deposition of Thin Films of Gallium Sulfide from a Novel...

Chemical Vapor Deposition 1999 Vol. 5; Iss. 5

Deposition of Thin Films of Gallium Sulfide from a Novel Liquid Single-Source Precursor, Ga(SOCNEt2)3, by Aerosol-Assisted CVD

G. A. Horley, M. R. Lazell, P. O'Brien
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Volume:
5
Year:
1999
Language:
english
Pages:
3
DOI:
10.1002/(sici)1521-3862(199910)5:53.0.co;2-l
File:
PDF, 279 KB
english, 1999
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