Depth profiles of Ta2O5/SiO2/Si structures: a combined X-ray photoemission, Auger electron, and secondary ion mass spectroscopic study
P. Gimmel, B. Gompf, D. Schmeißer, W. GöpelVolume:
333
Year:
1989
Language:
english
Pages:
4
DOI:
10.1007/bf00572354
File:
PDF, 434 KB
english, 1989