Analysis of sputter deposited and evaporated tantalum oxide layers on SiO2by SNMS, XPS, TDS and TRFA
K. -H. Müller, V. Rupertus, H. Oechsner, V. Scheuer, T. TschudiVolume:
333
Year:
1989
Language:
english
Pages:
4
DOI:
10.1007/bf00572362
File:
PDF, 370 KB
english, 1989