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Effect of a change in the intermediate layer accompanying deposition of metal on the electrophysical properties of a metal-semiconductor contact
S. S. Kil'chitskaya, S. V. Litvinenko, V. A. Skryshevskii, V. I. Strikha, V. P. TolstoiVolume:
31
Language:
english
Pages:
4
DOI:
10.1007/bf00895990
Date:
September, 1988
File:
PDF, 334 KB
english, 1988