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High-Resolution Thermal Processing of Semiconductors Using Pulsed-Laser Interference Patterning
M. K. Kelly, J. Rogg, C. E. Nebel, M. Stutzmann, Sz. KátaiVolume:
166
Year:
1998
Language:
english
Pages:
7
DOI:
10.1002/(sici)1521-396x(199804)166:23.0.co;2-p
File:
PDF, 317 KB
english, 1998