On batch homogeneity in horizontal CVD reactors (II). HCl gas-phase etching
Dr. F. Richter, Dipl.-Phys. Th. Morgenstern, Dr. R. SperlingVolume:
18
Year:
1983
Language:
english
Pages:
10
DOI:
10.1002/crat.2170180514
File:
PDF, 496 KB
english, 1983