Temperature dependence of the X-ray diffuse scattering...

Temperature dependence of the X-ray diffuse scattering intensity in V3Si in the temperature range from 8 to 300 K

Acad., Prof. N. N. Sirota, L. P. Polutchankina, N. S. Orlova
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Volume:
18
Year:
1983
Language:
english
Pages:
6
DOI:
10.1002/crat.2170180810
File:
PDF, 410 KB
english, 1983
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