Doping process control in silicon epitaxy (I). System identification
Dipl.-Chem. G. Kósza, Dip1.-Phys. T. Morgenstern, Dr. F. Richter, Dr. P. ValkóVolume:
18
Year:
1983
Language:
english
Pages:
8
DOI:
10.1002/crat.2170181218
File:
PDF, 451 KB
english, 1983