Infrared Study of Hydrogen in Ultra-Thin Silicon Nitride...

physica status solidi (a) 1999 Vol. 175; Iss. 1

Infrared Study of Hydrogen in Ultra-Thin Silicon Nitride Films Using Multiple Internal Reflection Spectroscopy (MIR) in 200 mm Silicon Wafers

M. Olivier, F. Martin, A. Chabli, G. Lefeuvre, F. Conne, N. Rochat
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Volume:
175
Year:
1999
Language:
english
Pages:
7
DOI:
10.1002/(sici)1521-396x(199909)175:13.0.co;2-m
File:
PDF, 191 KB
english, 1999
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