Preparation and Properties of Electrochemically Deposited...

physica status solidi (a) 1999 Vol. 176; Iss. 2

Preparation and Properties of Electrochemically Deposited Tungsten Oxide Films

M. G. Hutchins, N. A. Kamel, N. El-Kadry, A. A. Ramadan, K. Abdel-Hady
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Volume:
176
Year:
1999
Language:
english
Pages:
12
DOI:
10.1002/(sici)1521-396x(199912)176:23.0.co;2-t
File:
PDF, 284 KB
english, 1999
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