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Langmuir Probe Characterization of a RF Discharge Excited in Ar/C2F3Cl Mixtures during Plasma Deposition Processes
P. Špatenka, M. ŠíchaVolume:
29
Year:
1989
Language:
english
Pages:
10
DOI:
10.1002/ctpp.2150290108
File:
PDF, 529 KB
english, 1989