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Atmospheric pressure chemical vapor deposition of SiO2-TiO2 antireflective films from [tri-(tert-butoxy)siloxy-tri-(tert-butoxy)]titanium, [tC4H9O]3Si-O-Ti[OtC4H9]3, which is a single source alkoxide precursor
Dr. Chaitanya K. Narula, Dr. Ashima Varshney, Dr. Umar RiazVolume:
2
Year:
1996
Language:
english
Pages:
3
DOI:
10.1002/cvde.19960020104
File:
PDF, 331 KB
english, 1996