Silicon Carbonitride Films Produced by Remote Hydrogen Microwave Plasma CVD Using a (Dimethylamino)dimethylsilane Precursor
I. Blaszczyk-Lezak, A. M. Wrobel, M. P. M. Kivitorma, I. J. VayrynenVolume:
11
Year:
2005
Language:
english
Pages:
9
DOI:
10.1002/cvde.200406316
File:
PDF, 540 KB
english, 2005