MOCVD of Epitaxial PbO Films Below 400 °C Using Water Vapor

MOCVD of Epitaxial PbO Films Below 400 °C Using Water Vapor

S. V. Samoilenkov
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Volume:
12
Year:
2006
Language:
english
Pages:
3
DOI:
10.1002/cvde.200504212
File:
PDF, 166 KB
english, 2006
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