ALD of Hafnium Dioxide Thin Films Using the New Alkoxide...

Chemical Vapor Deposition 2006 Vol. 12; Iss. 11

ALD of Hafnium Dioxide Thin Films Using the New Alkoxide Precursor Hafnium 3-Methyl-3-pentoxide, Hf(mp)4

W. Cho, K.-S. An, T.-M. Chung, C. G. Kim, B.-S. So, Y.-H. You, J.-H. Hwang, D. Jung, Y. Kim
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Volume:
12
Year:
2006
Language:
english
Pages:
5
DOI:
10.1002/cvde.200506458
File:
PDF, 332 KB
english, 2006
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