Plasma Characterization of...

Chemical Vapor Deposition 2006 Vol. 12; Iss. 12

Plasma Characterization of Oxygen-Tetramethylsilane Mixtures for the Plasma-Enhanced CVD of SiOxCyHz Thin Films

Á. Yanguas-Gil, Á. Barranco, J. Cotrino, P. Gröning, A. R. González-Elipe
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Volume:
12
Year:
2006
Language:
english
Pages:
8
DOI:
10.1002/cvde.200606496
File:
PDF, 362 KB
english, 2006
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